A Chinese technology startup, Langdao Silex, unveiled a prototype of an extreme ultraviolet (EUV) light source at the 26th China International Industry Fair in Shanghai. The prototype, named "FlintNano LPP-OXXO," is designed to compete with ASML, the Dutch company that currently dominates the EUV lithography market. According to the company, the prototype incorporates most of its core components through independent research and development, achieving a localization rate of approximately 90%.
The EUV light source is a critical component in the production of advanced semiconductors, enabling the creation of smaller and more efficient chips. Langdao Silex claims that its prototype represents a significant step toward reducing reliance on foreign technology in this vital sector. However, the Dutch firm ASML has not expressed concern over the development, indicating that the progress may not immediately threaten its market position.
This development comes amid broader discussions about China's growing influence in global technology and manufacturing. The EU has also been focusing on protecting its industrial sectors from Chinese imports, with leaders in Brussels identifying chemicals and machinery as key areas requiring safeguard measures. Meanwhile, the global semiconductor industry continues to face pressures from both Chinese competition and economic uncertainties in the United States.
